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Fundamental properties of the counter-facing plasma focus device for extreme ultra-violet light source
Fundamental properties of the counter-facing plasma focus device for extreme ultra-violet light source
2017
Tatsuya Sodekoda
Shintaro Kurata
Hajime Kuwabara
Kazuhiko Horioka
Keywords:
Materials science
Dense plasma focus
energy density
ultraviolet radiation
Wavelength
Optoelectronics
Electromagnetic radiation
ultra violet light
Electric current
plasma density
Correction
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