RECENT ADVANCES INGASEOUS DIELECTRICS AT OAKRIDGENATIONAL LABORATORY

Recent developmentsin gaseous dielectrics are discussed with emphasison dielectric gas mixtures containingSF6. Recent findingson the isotopic,pressure, and nonuniform field dependence of the dielectric strengthof gases are also presented,and ways to enhance the corona-stabilization characteristicsof gas mixtures by appropriateadditives (e.g. to SF6)are outlined. In addition, results are presented on the spark decompositionproductsof SF6 and the alleviation of the harmful effects of conductingparticles by particle coatingin situ. Finally,electron attachment, electron drift velocit'y, and breakdown propertiesof gas mixtures (e.g.C2F6 or C3F8 in Ar or CH4) - comprisedof electron attachingand electron conductivityenhancing components- which have promise for use in pulsed power technologiesare reported.