Multifunctional MoOx and MoOxNy films with 2.5 < x < 3.0 and y < 0.2 prepared using controlled reactive deep oscillation magnetron sputtering

Abstract Reactive deep oscillation magnetron sputtering with a pulsed reactive gas flow control and to-substrate reactive gas injection into the high-density plasma in front of the sputtered Mo target was used for a low-temperature (