Significant improvement of the osseointegration of zirconia dental implants by HS-LEIS analysis

Abstract The use of sintered yttria stabilized zirconia dental implants is a recent development. After initial successes with these new implants a pattern of erratic results emerged. Reliable osseointegration would not always occur. High-sensitivity low energy ion scattering (HS-LEIS) is used to investigate both virgin and rejected implants. The surfaces of the implant are found to be covered with both an organic and inorganic contamination layer. Sterilization does not remove this contamination. Using LEIS as analytic tool a new cleaning process has been developed. Since this cleaning process is in use, the failure rate has dropped to a very low value.