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A Mechanism of Degradation of Gate Oxide by Charging During Ion Implantation
A Mechanism of Degradation of Gate Oxide by Charging During Ion Implantation
1990
Hirotaka Muto
Haruhisa Fujii
Koichiro Nakanishi
Hirohisa Yamamoto
Keywords:
Ion implantation
Gate oxide
Analytical chemistry
Chemistry
Time-dependent gate oxide breakdown
Optoelectronics
Degradation (geology)
Correction
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