Proof‐of‐principle of a novel method for sputter‐deposition of high Tc supeconducting films via a computer‐controlled mass analyzed ion beam

A novel concept is demonstrated for ion beam sputter‐induced deposition of high Tc superconductor films. The concept involves the use of a well‐focused ion beam which can be sequentially directed via a set of x‐y electrostatic deflection plates onto three or more different elemental or compound targets which are constituents of the desired composite film. The deflection plates are driven by two ±1000 volt bipolar programmable power supplies which are controlled by a DEC LSI 11/73 computer. A custom program drives two D/A converters to provide the ±10 volt analog signal which is used to drive the power supplies in such a way that the ion beam is positioned on selected spots on the different targets. By programming the dwell time for each targe according to the known sputtering yield and desired layer thickness for each material, it is possible to deposit composite films from a well‐controlled sub‐monolayer up to thicknesses determined only by the available deposition time. Initial results on the deposition...