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Impact of Mobility Boosters (XsSOI, CESL, TiN gate) on the Performance of ≪100≫ or ≪110≫ oriented FDSOI cMOSFETs for the 32nm Node
Impact of Mobility Boosters (XsSOI, CESL, TiN gate) on the Performance of ≪100≫ or ≪110≫ oriented FDSOI cMOSFETs for the 32nm Node
2007
François Andrieu
Olivier Faynot
F. Rochette
J. C. Barbe
C. Buj
Y. Bogumilowicz
F. Allain
Vincent Delaye
D. Lafond
F. Aussenac
Sylvain Feruglio
Joël Eymery
Takashi Akatsu
P. Maury
Laurent Brevard
L. Tosti
H. Dansas
E. Rouchouze
Jean-Michel Hartmann
Laurent Vandroux
Mikael Cassé
F Bœuf
Claire Fenouillet-Béranger
F. Brunier
Ian Cayrefourcq
Carolyn M. Mazure
G. Gbibaudo
Simon Deleonibus
Keywords:
Silicon on insulator
Materials science
Tin
Optoelectronics
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