Research on the Friction and Wear Behaviours of Freestanding CVD Diamond Film Wafer under Different Lubrication Conditions

ABSTRACT Freestandingdiamondfilmwaferwiththethicknessof0.8mmwaspreparedbyHFCVDmethod. Friction properties were evaluated on a reciprocating ball-on-plate tribometer. Scanning electron microscopy, X-ray diffraction and EDS were adopted to characterize the friction and wear behavior of polished and unpolished thick diamond films under dry and water lubricating conditions. The results show that the friction coefficient of polished thick diamond film was lower than the unpolished one. The effect of water lubricating on reducing friction coefficient was significant. The thick diamond film’wear volume is very small. In terms of tribological mechanism,the main cause of a small amount of wear volume are three body abrasion wear and abrasive wear.