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Selective Ion Bombardment for the Control of Laser‐Induced Photochemical Dry Etching of Semiconductors
Selective Ion Bombardment for the Control of Laser‐Induced Photochemical Dry Etching of Semiconductors
1989
Carol I. H. Ashby
David R. Myers
F.L. Vook
Keywords:
Scanning electron microscope
Dry etching
Analytical chemistry
Ion implantation
Thin film
Laser
Doping
Inorganic chemistry
Semiconductor
Ion
Chemistry
Photochemistry
Irradiation
Correction
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