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Fundamental Etching and Roughening Mechanisms of Photoresist Polymers during Plasma Processing
Fundamental Etching and Roughening Mechanisms of Photoresist Polymers during Plasma Processing
2009
D. Nest
T.-Y. Chung
David B. Graves
F. Weilnboeck
Robert L. Bruce
Tsung Cheng Lin
R. J. Phaneuf
G. S. Oehrlein
Eric R. Hudson
Deyan Wang
C. Andes
Keywords:
Scanning electron microscope
Polymer
Etching
Analytical chemistry
Plasma processing
Ultraviolet
Photoresist
Fourier transform infrared spectroscopy
Integrated circuit
Materials science
Optoelectronics
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