Degradation of phenol assisted by spinel cooper ferrites and residual magnetic materials

espanolLos compuestos organicos presentes en aguas residuales industriales a menudo son resistentes a tratamientos convencionales. En la actualidad se estan desarrollando nuevos tratamientos a escala de laboratorio aplicados a efluentes simulados de baja complejidad. Este trabajo se orienta a la evaluacion de la degradacion de soluciones acuosas de fenol (un compuesto recalcitrante que puede considerarse como sustancia patron), mediante la accion de luz UV irradiada en presencia de H2 O2 y tres diferentes materiales usados como potenciadores de la degradacion. Como potenciadores se utilizaron: la fraccion magnetica de cenizas del volcan Puyehue, lana de acero comercial y nanoparticulas (ferroespinelas de cobre, Cu2 FeO4). Los materiales solidos fueron caracterizados convenientemente.Los experimentos fueron llevados a cabo a temperatura ambiente con soluciones acuosas de fenol (0.9411 g L-1) al pH de la solucion (ca. 6.5), concentracion de H2 O2 entre 0.0-0.2 mol L-1, masa agregada del material potenciador entre 0.0-1.5 g L-1, y luz UV (254 nm). Se observo un efecto sinergico sobre la degradacion del contaminante entre el material potenciador y la luz UV en presencia de H2 O2. En las condiciones de trabajo, una solucion de fenol bajo radiacion UV de 160 minutos degrado ca. 95%. EnglishOrganic compounds present in industrial wastewater are mostly resistant to conventional treatments. New treatments are being developed in the laboratory applied in simulated low complexity scale effluents. This paper is in focus on the evaluation of the degradation of aqueous solutions of phenol (a recalcitrant pattern substance). UV light irradiated in the presence of H2 O2 and three materials used as degradation enhancers. The magnetic fraction of the ashes of Puyehue volcano, commercial steel wool and spinel copper ferrite nanoparticles (Cu2 FeO4) were used. These solid materials were characterized conveniently. Experiments were performed at room temperature with aqueous solutions of phenol (0.9411 g L-1) at pH solution (ca. 6.5), H2 O2 concentration between 0.0-0.2 mol L-1, added mass of enhancer materials between 0.0-1.5 g L-1, UV (254 nm). The reaction was monitored by HPLC and UV spectrophotometry. A synergistic effect of the enhancer materials and the UV light on the degradation of pollutants in the presence of H2 O2 was observed. Under suitable conditions, a solution of phenol under UV radiation for 160 minutes degrades up to 95%.