Atomic Diffusion Bonding using Y2O3 and ZrO2 films

We demonstrated atomic diffusion bonding (ADB) of wafers at room temperature using Y 2 O 3 and ZrO 2 films. Results showed that bonded interface disappeared perfectly (Y 2 O 3 films) or partially (ZrO 2 film) at room temperature, implying high bonding potential using these oxide films in ADB.