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Application of phase shift focus monitor in EUVL process control
Application of phase shift focus monitor in EUVL process control
2013
Lei Sun
Sudhar Raghunathan
Vibhu Jindal
Eric M. Gullikson
Pawitter Mangat
Iacopo Mochi
Kenneth A. Goldberg
Markus P. Benk
Oleg Kritsun
Tom Wallow
Deniz E. Civay
O. R. Wood
Keywords:
Optoelectronics
Phase (waves)
Process control
Extreme ultraviolet lithography
Materials science
Engineering physics
Correction
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