Production of thin tungsten films

Abstract An analysis is given of thin tungsten films deposited in an oil-free vacuum at pressures better than 8 × 10 -7 Torr. The rate of film deposition using an electron-plasma evaporator was between 150 and 1500 A min -1 . The films were of single phase (the α-W phase) and were textured in the [110] direction. Chemical analysis confirmed the presence of a small proportion of contaminants in the films, and an oxygen concentration not exceeding 1.2 at.%.