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Plasma Etching of SiO2 with CF3I Gas in Plasma-Enhanced Chemical Vapor Deposition Chamber for In-Situ Cleaning
Plasma Etching of SiO2 with CF3I Gas in Plasma-Enhanced Chemical Vapor Deposition Chamber for In-Situ Cleaning
2019
Jin-Seong Park
In-Sung Park
Seon-Yong Kim
Taehoon Lee
Jinho Ahn
Tae-Hun Shim
Jea-Gun Park
Keywords:
Plasma-enhanced chemical vapor deposition
Plasma etching
Inorganic chemistry
Materials science
In situ
Correction
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