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In-situ monitoring of thin film reactions during rapid thermal annealing: nickel silicide formation
In-situ monitoring of thin film reactions during rapid thermal annealing: nickel silicide formation
2003
C. Lavoie
Robert J. Purtell
C. Coia
Christophe Detavernier
P. Desjardins
Jean Jordan-Sweet
Cyril Cabral
Fm Dheurle
Jme Harper
Keywords:
Annealing (metallurgy)
Thin film
Nickel silicide
Materials science
In situ
Metallurgy
rapid thermal annealing
Correction
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