Old Web
English
Sign In
Acemap
>
Paper
>
Application of sputter etching treatment to the formation of semiconducting silicide film on Si substrate
Application of sputter etching treatment to the formation of semiconducting silicide film on Si substrate
2012
Kenji Yamaguchi
Fumitaka Esaka
Masato Sasase
Hiroyuki Yamamoto
Kiichi Hojou
Keywords:
Substrate (chemistry)
Sputtering
Thin film
Reactive-ion etching
Etching
Metallurgy
Silicide
Ceramic materials
Materials science
si substrate
Optoelectronics
Correction
Source
Cite
Save
Machine Reading By IdeaReader
1
References
0
Citations
NaN
KQI
[]