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Growth of supported metallic ultrathin films deposited by plasma sputtering
Growth of supported metallic ultrathin films deposited by plasma sputtering
2000
Pascal Brault
Anne-Lise Thomann
J.P. Rozenbaum
Caroline Andreazza
Pascal Andreazza
M. Rousseau
H. Estrade-Szwarckopf
G. Blondiaux
T. Sauvage
Yves Tessier
A. Berthet
J.C. Bertolini
F.J. Cadete Santos Aires
F. Monnet
C. Mirodatos
Christine Charles
Roderick Boswell
Keywords:
Inorganic chemistry
Sputtering
Plasma
Chemistry
Metal
Correction
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