Reflectometry of charge transitions in a silicon quadruple dot

Gate-controlled silicon quantum devices are currently moving from academic proof-of-principle studies to industrial fabrication, while increasing their complexity from single- or double-dot devices to larger arrays. We perform gate-based high-frequency reflectometry measurements on a 2x2 array of silicon quantum dots fabricated entirely using 300 mm foundry processes. Utilizing the capacitive couplings within the dot array, it is sufficient to connect only one gate electrode to one reflectometry resonator and still establish single-electron occupation in each of the four dots and detect single-electron movements with high bandwidth. A global top-gate electrode adjusts the overall tunneling times, while linear combinations of side-gate voltages yield detailed charge stability diagrams. We support our findings with $\mathbf{k}\cdot\mathbf{p}$ modeling and electrostatic simulations based on a constant interaction model, and experimentally demonstrate single-shot detection of interdot charge transitions with unity signal-to-noise ratios at bandwidths exceeding 30 kHz. Our techniques may find use in the scaling of few-dot spin-qubit devices to large-scale quantum processors.