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Industrial Carbon-Doped SiO$_2$ (CDO) Film Etching in Ar/O$_2$/c-C$_4$F$_8$ High Density Plasmas
Industrial Carbon-Doped SiO$_2$ (CDO) Film Etching in Ar/O$_2$/c-C$_4$F$_8$ High Density Plasmas
2005
A. Islyaikin
V. Krastev
I. Reid
G. Hughes
A.R. Ellingboe
Keywords:
Doping
Plasma
Etching
Carbon
Chemistry
Inorganic chemistry
Analytical chemistry
carbon doped
high density
Materials science
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