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Acemap > Paper > Structural Properties and Electrical Characteristics of High-κ Lu 2 O 3 and Lu 2 TiO 5 Gate Dielectrics for InGaZnO Thin-Film Transistors

Structural Properties and Electrical Characteristics of High-κ Lu 2 O 3 and Lu 2 TiO 5 Gate Dielectrics for InGaZnO Thin-Film Transistors

2015 
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