Old Web
English
Sign In
Acemap
>
Paper
>
Properties of Plasma‐Enhanced CVD Silicon Films II . Films Doped During Deposition
Properties of Plasma‐Enhanced CVD Silicon Films II . Films Doped During Deposition
1982
T. I. Kamins
K. L. Chiang
Keywords:
Inorganic chemistry
Doping
Plasma
Carbon film
Chemistry
Silicon
Deposition (law)
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
3
Citations
NaN
KQI
[]