Modified configuration of TiN film deposited on stainless steel substrate using magnetized sheet plasma source

Deposition of TiN film on washer stainless steel type 304 was done using magnetized sheet plasma negative ion source. A modified configuration of substrate, target and magnets was used. XRD results showed that coated substrate exhibited TiN(200), Ti2N(220), TiN(220) and TiN(311) XRD peaks. Cross-sectional SEM results showed the TiN film thickness of 78.05 m and deposition rate of 0.65m/min. Surface energy analysis of the substrates was also done using contact angle measurement. Results showed that TiN deposit increased the hydrophobicity and decreased the surface energy of the stainless steel.