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Study of Latex Sphere Lithography for High Aspect Ratio Dry Silicon Etching
Study of Latex Sphere Lithography for High Aspect Ratio Dry Silicon Etching
2019
I.A. Morozov
Alexander S. Gudovskikh
A V Uvarov
A I Baranov
Vladimir Sivakov
Dmitri Kudryashov
Keywords:
Physics
Condensed matter physics
Lithography
Aspect ratio (aeronautics)
Optoelectronics
silicon etching
Nanosphere lithography
Silicon
Correction
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