LPP EUV light source employing high power C02 laser
2008
We are developing a high power CO 2 laser system for a LPP EUV light source. Recent theoretical and experimental data
demonstrate the advantages of the combination of a CO 2 laser with a Sn target including the generation of a high CE and
low debris plasma with low energy ions and low out-of-band radiation. Our laser system is a short pulse CO 2 MOPA
(Master Oscillator Power Amplifier) system with 22 ns pulse width and multi kW average power at 100 kHz repetition
rate. We achieved an average laser power of 8 kW with a single laser beam having very good beam quality. A EUV in-band
power of 60 W at the intermediate focus was generated irradiating a rotating tin plate with 6 kW laser power.
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