Laser crystallised poly-Si TFTs for AMLCDs

Abstract The technology for the fabrication of poly-Si TFTs on glass substrates has now reached a level of maturity such that the first commercial products are becoming available. The technology choice will be briefly reviewed and the reasons for the preferred use of excimer laser crystallisation will be summarised. Some of the key device and technology issues will be reviewed in this paper, including the role of the incident laser energy density in fabricating high performance TFTs and its dependence on film thickness. The issues discussed above have determined our design and fabrication of poly-Si AMLCDs and the results obtained from a 2-inch array, with full drive circuit integration, are illustrated.