ECR-PLASMA ASSISTED LASER ABLATION OF AS-DEPOSITED SUPERCONDUCTING THIN FILMS FOR APPLICATION IN MICROELECTRONICS

Abstract A method for the growth of as-deposited superconducting thin films which combines YAG-laser ablation and oxidation by an ECR-excited oxygen plasma is described. It is demonstrated by depositions on YSZr and on SrTiO3 that this one-step method is fully compatible with the requirements of large surface homogeneity, low substrate temperature and low oxygen partial pressure for application in micro-electronics.