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A Program-Erasable High-kappa {Hf}_{0.3}{{N}}_{0.2}{{O}}_{0.5} MIS Capacitor With Good Retention
A Program-Erasable High-kappa {Hf}_{0.3}{{N}}_{0.2}{{O}}_{0.5} MIS Capacitor With Good Retention
2007
Hsueh Jen Yang
Albert Chin
W. J. Chen
Chao-Ching Cheng
W. L. Huang
I. J. Hsieh
S. P. McAlister
Keywords:
Analytical chemistry
MIS capacitor
Materials science
Kappa
Correction
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