PHOTOACTIVATION'MODE'AND'THE' DISTANCE'OF'LIGHTB CURING'UNIT'IN' MECHANICAL'PROPERTIES'OF' SILORANE'AND'METHACRYLATE' BASED'RESINS*

* * ABSTRACT' * OBJECTIVES:*This* in* vitro* work* had* as* aim* evaluate* the* effect* of* photoactivation*mode*and*the*distance*of*light \curing*unit*(LCU)*in* microhardness* Knoop* (KHN)* and* the* diametrical* tensile* strength* (DTS)*of*methacrylate*and*silorane \based*resins.* MATERIALS'AND' METHODS:*Filtek*Z250*(methacrylate \based*resin)*and*Filtek* P90*