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Atomically etching graphene using O 3 P radical generated in remote O 2 plasma
Atomically etching graphene using O 3 P radical generated in remote O 2 plasma
2021
Liugang Hu
Takayoshi Tsutsumi
Shih-Nan Hsiao
Hiroki Kondo
Kenji Ishikawa
Makoto Sekine
Masaru Hori
Keywords:
Graphene
Etching (microfabrication)
Materials science
Plasma
Optoelectronics
Correction
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