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Characterization of line defects in CVD graphene films with scanning plasmon interferometry
Characterization of line defects in CVD graphene films with scanning plasmon interferometry
2013
Zhe Fei
A. S. Rodin
Will Gannett
Siyuan Dai
William Regan
Alexander McLeod
Martin Wagner
Benji Aleman
Mark H. Thiemens
G. Dominguez
Antonio Castro-Neto
Alex Zettle
Fritz Keilmann
Michael M. Fogler
D. N. Basov
Keywords:
Plasmon
Graphene
Analytical chemistry
Materials science
Interferometry
line defects
cvd graphene
Optoelectronics
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