Ultrafast laser inscription of astrophotonic integrated optical circuits

2020 
Ultrafast laser inscription is a technique to create low-loss three dimensional optical circuits within bulk dielectrics that is compatible with a wide range of optical materials. Its unique capabilities and the ability to rapid prototype and quickly iterate through different designs has made it exceptionally attractive for astrophotonics. This paper will summarize the basic aspects of ultrafast laser inscription and review recent progress in its application to astrophotonics, such as stellar interferometry.
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