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New Antireflective Coating Materials Containing a Novel Chromophore for KrF Laser Lithography
New Antireflective Coating Materials Containing a Novel Chromophore for KrF Laser Lithography
2001
Kwang-Duk Ahn
Dong Keun Han
Jun-Young Kim
Seong-Hyun Ha
Dae-Youp Lee
Jeong-Lim Nam
Keywords:
Chromophore
Anti-reflective coating
Maskless lithography
Materials science
Optics
Optoelectronics
Photochemistry
Correction
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