Pulsed laser deposition of thin film of molybdenum

Deposition of Molybdenum thin film via pulsed laser deposition technique under vacuum (10-5 Torr) and different pressures of Argon gas is reported on Si and SS substrate. The effect of the baking of the target chamber, back ground gas pressure and the deposition time on the crystal structures, surface morphology and the reflectivity of the thin film of Mo is presented in the paper.