Decomposition-aware standard cell design flows to enable double-patterning technology
2011
Maintaining the microelectronics industry's aggressive pace of density scaling beyond the resolution limits of optical
lithography is forcing the introduction of double-patterning technology (DPT) that effectively doubles the pattern density
achievable with 193nm optical lithography. This paper investigates the degree to which DPT affects design tools, layout
methodologies, and data standards. Design solutions are demonstrated and the efficiency of various double-patterning
aware design methodologies is compared based on the first metal level of a 20nm-node standard cell design flow.
Necessary design-tool and data-standard requirements for a DPT-aware standard cell design flows are enumerated and
summarized.
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