Voltammetric studies of underpotential deposition of T1 from T1(I) film confined to Ag electrodes

Abstract T1(I) can be formed chemically on a Ag electrode due to the strong adsorption of I − and low surface solubility of T1(I). The ease of forming the film depends on the detailed structure of the Ag surface in the sequence of Ag(111) > Ag(100) > Ag(110) > polycrystalline Ag. Underpotential deposition ( upd ) of T1 from T1(I) film confined to the Ag electrode surface was studied. In contrast to the results of the formation of two upd monolayers of T1 from T1 + solution, only one upd monolayer (or submonolayer) of T1 can be formed from the T1(I) film before the onset of the bulk T1 deposition. The desired submonolayer quantities of the T1 upd layer, with or without the bulk T1 layers deposited on it, can be obtained by controlling the chemical deposition process of T1(I).