Theoretical and Experimental Databases for High Average Power EUV Light Source by Laser Produced Plasma

Extreme ultraviolet (EUV) radiation from laser‐produced plasma has been thoroughly studied for application in mass‐production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser‐produced plasma (LPP) but also for EUV emissions from magnetic‐confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare‐gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation‐of‐state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.