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Low resistance n-contact for UVC LEDs by a two-step plasma etching process
Low resistance n-contact for UVC LEDs by a two-step plasma etching process
2020
Hyun Kyong Cho
Ji Hye Kang
Luca Sulmoni
Kevin Kunkel
Jens Rass
Norman Susilo
Tim Wernicke
Sven Einfeldt
Michael Kneissl
Keywords:
Chemistry
Plasma etching
low resistance
Analytical chemistry
two step
Optoelectronics
Light-emitting diode
Correction
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