Band gap narrowing models tested on low recombination phosphorus laser doped silicon

2016 
This manuscript discusses bandgap narrowing models for highly phosphorus doped silicon. We simulate the recombination current pre-factor J0,phos in PC1Dmod 6.2 of measured doping profiles and apply the theoretical band gap narrowing model of Schenk [J. Appl. Phys. 84, 3684 (1998)] and an empirical band gap narrowing model of Yan and Cuevas [J. Appl. Phys. 114, 044508 (2013)]. The recombination current pre-factor of unpassivated and passivated samples measured by the photo conductance measurement and simulated J0,phos agrees well, when the band gap narrowing model of Yan and Cuevas is applied. With the band gap narrowing model of Schenk, the simulation cannot reproduce the measured J0,phos. Furthermore, the recombination current pre-factor of our phosphorus laser doped silicon samples are comparable with furnace diffused samples. There is no indication of recombination active defects, thus no laser induced defects in the diffused volume.
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