Study on Repetitive PID Control of Linear Motor in Wafer Stage of Lithography
2012
Abstract A ‘Repetitive + PID + feedforward’ control mode is proposed to improve the trajectory-tracking performance of linear motors in wafer stage of lithography. The positioning error of linear motor is decreased greatly compared to PID control and ‘PID + feedforward’ control. The contradiction of high speed and high positioning accuracy has been solved. The results of MATLAB simulation and experiments demonstrated the effectiveness of the proposed methods.
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