Formation in situ of electrodeposited fulleride film on a microelectrode

Abstract In this paper, the formation in situ of an electrodeposited film of (TBA + ) n (C n − 60 ) ( n = 1 to 3) on a microelectrode and its voltammetric behavior have been studied. The method consists of electroreducing C 60 in a mixed solvent of acetonitrile and xylene (1:6 v/v) and a supporting electrolyte of 0.08 M TBAPF 6 at a potential sufficiently negative to generate C 3− 60 anion, followed by deposition of (TBA + ) 3 (C 3− 60 ) on a microdisk electrode. Deposition conditions of the film and some of its characteristics were investigated. The standard surface electron-transfer rate constants k 0 and electron-transfer coefficient α of the two stripping reactions were determined.