Shadow lithography for in-situ growth of generic semiconductor/superconductor devices.

The quality of interfaces and surfaces is crucial for the performance of nanoscale devices. A pertinent example is the close tie between current progress in gate-tunable and topological superconductivity using semiconductor/superconductor electronic devices and the hard proximity-induced superconducting gap obtained from epitaxial indium arsenide/aluminium heterostructures. Fabrication of devices requires selective etch processes; these only exist for InAs/Al hybrids, which precludes the use of other, potentially better material combinations in functional devices. We present a crystal growth platform based on three-dimensional structuring of growth substrates for synthesising semiconductor nanowires with in-situ patterned superconductor shells, which enables independent choice of material by eliminating etching. We realise and characterise all the most frequently used architectures in superconducting hybrid devices, finding increased yield and electrostatic stability compared to etched devices, along with evidence of ballistic superconductivity. In addition to aluminium, we present hybrid devices based on tantalum, niobium and vanadium.