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Novel EUV Photoresist for Sub-7 nm Node
Novel EUV Photoresist for Sub-7 nm Node
2017
Junya Suzuki
Tsuyoshi Furukawa
Hiromu Miyata
Motohiro Shiratani
Takehiko Naruoka
Ken Maruyama
Hiroki Nakagawa
Tomoki Nagai
Keywords:
Photochemistry
Photoresist
Materials science
Extreme ultraviolet lithography
Optoelectronics
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