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Lightly Porous SiCOH 2.7 Dielectric Film Development for 65/45/32 nm Advanced Nanoelectronic CMOS Devices
Lightly Porous SiCOH 2.7 Dielectric Film Development for 65/45/32 nm Advanced Nanoelectronic CMOS Devices
2008
Son Van Nguyen
Vince McGahay
Mark Sherwood
N. Klymko
S. Cohen
Eva E. Simonyi
Alfred Grill
Hosadurga Shobha
Darryl D. Restaino
Sarah L. Lane
Steven E. Molis
Kelly Malone
E. Liniger
Vish Patel
Stephen M. Gates
Daniel C. Edelstein
Sanjay Mehta
Thomas H. Ivers
Keywords:
Dielectric
Porosity
CMOS
Materials science
Electronic engineering
Optoelectronics
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