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Characteristic change of GeO 2 / Ge interface by Hf-Post Matallization Annealing
Characteristic change of GeO 2 / Ge interface by Hf-Post Matallization Annealing
2017
Haruka Fujiwara
Yoshitaka Iwazaki
Tomo Ueno
Hiroshi Yamada
Mitaro Namiki
Keywords:
Annealing (metallurgy)
Nuclear magnetic resonance
Insulator (electricity)
Semiconductor
Materials science
Optoelectronics
Correction
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