Carbon thin film deposition using high power pulsed magnetronsputtering

High power pulsed magnetron sputtering (HPPMS) discharge is a new i-PVD technique. With HPPMS, high plasma densities and highly ionized sputtered materials can be produced. The high power is applied to conventional magnetron cathodes in short pulses (typically 50-150 ms). The magnetron cathode was driven by an experimental pulsed power supply in development by Advanced Energy Industries. The power supply can provide peak power pulses in the megawatt range at a repetition frequency of up to 500 Hz and a pulse width in the range of 50-150 ms. In this paper, the deposition of thin (<20 nm) films with HPPMS using carbon cathodes in a 6-inch circular magnetron is described. We present evidence for increased plasma ion production compared to continuous D.C. magnetron sputtering. Carbon film densities up to 2.7 g/cm3 have been measured. The density is significantly increased compared to films grown by PECVD (2.1g/cm3) or D.C. sputter deposition (<2.0 g/cm3). The current voltage characteristics of the discharges and thin film characterization are also discussed.