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Stress Analysis in a Si 1- x Ge x -Channel-Transistor by Scanning Moiré Fringe Imaging
Stress Analysis in a Si 1- x Ge x -Channel-Transistor by Scanning Moiré Fringe Imaging
2014
Suhyun Kim
Younheum Jung
Joong Jung Kim
Sun Young Lee
Haebum Lee
Keywords:
Moiré pattern
Analytical chemistry
Chemistry
Transistor
Communication channel
Optics
Correction
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