Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source
2011
A laser produced plasma (LPP) extreme ultraviolet (EUV) light source of 13.5 nm has been developed for next
generation lithography. Sn plasma is an efficient generator of 13.5 nm EUV light. On the other hand, deposition of Sn
particles which strongly affects EUV collector mirror lifetime is a critical issue for long-term stable operation of the
high-power EUV light source. In this paper we describe about the optimization of tin debris mitigation with a compact
EUV generation system. We observe almost all of Sn fragments generated after a pre-pulse irradiation are vaporized by a
main CO 2 pulse laser with a droplet of 20 μm in diameter. An EUV conversion efficiency (CE) of 3.4% at a maximum is
obtained for the 20 μm droplet. These results indicate the debris mitigation can be achieved without degradation of the
high EUV CE.
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