Tunable Electron and Hole Injection Enabled by Atomically Thin Tunneling Layer for Improved Contact Resistance and Dual Channel Transport in MoS2/WSe2 van der Waals Heterostructure

2018 
Two-dimensional (2D) material-based heterostructures provide a unique platform where interactions between stacked 2D layers can enhance the electrical and opto-electrical properties as well as give rise to interesting new phenomena. Here, the operation of a van der Waals heterostructure device comprising of vertically stacked bilayer MoS2 and few layered WSe2 has been demonstrated in which an atomically thin MoS2 layer has been employed as a tunneling layer to the underlying WSe2 layer. In this way, simultaneous contacts to both MoS2 and WSe2 2D layers have been established by forming a direct metal–semiconductor to MoS2 and a tunneling-based metal–insulator–semiconductor contacts to WSe2, respectively. The use of MoS2 as a dielectric tunneling layer results in an improved contact resistance (80 kΩ μm) for WSe2 contact, which is attributed to reduction in the effective Schottky barrier height and is also confirmed from the temperature-dependent measurement. Furthermore, this unique contact engineering and...
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