Preparation of ceria thin films and microtubes by vapor-phase deposition using NiO as oxygen source

Abstract A modified version of electrochemical vapor deposition (EVD) using NiO as an oxygen source was applied to the fabrication of CeO 2 thin films and microtubes. Cerium trichloride was used as a metal source, and NiO pellets and surface-oxidized Ni wires of 125 μ m diameter as substrates for deposition. Thin films of cubic CeO 2 were formed on both substrates by the vapor-phase reaction at 900 and 950°C. Furthermore, ceria microtubes of 130 μ m diameter were obtained by soaking the ceria-coated Ni wires in hydrochloric acid.